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Nickel sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
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The accumulation of radiation defects in the crystal lattice of nickel in the course of irradiation leads to an increase in the metal sputtering yield from the surface of grains, making it comparable with the sputtering yield from the intergranular region.Anamorelin hydrochloride These result in development of the heavy ion acceleration facilities and for the high-energy heavy-ion doping of deep layers in semiconductors.Tecovirimat PMID:24140575
